Tibco News, June 30, the Dutch government issued the latest regulations on the export control of semiconductor equipment, some media interpreted this as the control of photolithography against China again escalated to all DUV. In fact, these new export control regulations target advanced 45nm and below chip manufacturing technologies, including state-of-the-art ALD atomic deposition equipment, epitaxial growth equipment, plasma deposition equipment and immersion lithography systems, as well as the technology, software used to use and develop such advanced equipment.
In a statement to Tibco, ASML emphasized that the Dutch government's new export control regulations only cover some of the latest DUV models, including the TWINSCAN NXT:2000i and subsequent immersion lithography systems. EUV lithography has been restricted previously, and the shipment of other systems is not controlled by the Dutch government. According to ASML official website information, DUV immersion lithography system, including: TWINSCAN NXT:2050i, NXT:2050i, NXT:1980Di three lithography machine, these can carry out 38nm ~ 45nm process wafer processing.
In addition, dry DUV lithography machines capable of wafer processing above 45nm, such as 65nm~220nm process, such as TWINSCAN XT:400L, XT:1460K, NXT:870, etc., are not included in the Dutch sanctions list.
The Dutch control list, as translated by Tibco, is as follows:
Regulation MinBuza.2023.15246-27 issued by the Minister of Foreign Trade and Development Cooperation of the Netherlands provides for licensing requirements for the export of advanced production equipment for semiconductors not previously mentioned in Annex I of Regulation No. 2021/821 (relating to advanced semiconductor manufacturing equipment)
Article 2: This regulation prohibits the export of advanced semiconductor production equipment from the Netherlands without the permission of the Minister.
Article 3:
1. The application for the permit mentioned in Article 2 shall be made by the exporter and submitted to the prosecutor.
2. In any case, the application shall contain:
a）the name and address of the exporter;
b）Name and address of the recipient and end-user of the advanced semiconductor manufacturing equipment;
c）Name and address of the recipient and end-user of the advanced semiconductor manufacturing equipment.
3, in any case, the prosecutor has the right to request the exporter to provide the contract on the export, and a statement on the end use.
Article 4:
The license described in Article 2, may be subject to conditions and provisions.
The granting of the license described in Article 2 can exist with qualifications.
Article V:
The licenses mentioned in Article II may be revoked in the following cases:
a)The license was issued based on incorrect or incomplete information;
b)The terms, conditions and restrictions of the license were not followed;
c)For reasons of national foreign and security policy.
Post time: Jul-02-2023